Agarose Cleaning Optimization for DGT Devices Specific for Cesium

Sadewo, Prasetyo Haryo and Suzuki-Muresan, Tomo and Widiharto, Andang and Muresan, B. (2019) Agarose Cleaning Optimization for DGT Devices Specific for Cesium. In: IOP Conference Series: Materials Science and Engineering, 2019.

[thumbnail of Sadewo_2019_IOP_Conf._Ser.__Mater._Sci._Eng._599_012027.pdf] Text
Sadewo_2019_IOP_Conf._Ser.__Mater._Sci._Eng._599_012027.pdf
Restricted to Registered users only

Download (584kB) | Request a copy

Abstract

Agarose gels commonly used in electrophoresis are regularly checked by its manufacturers for the absence of contaminating nucleases or residual sulfates. It is also tested for several metals and trace elements: Pb, Cd, Co, Cu, Zn, K, Ca, Cr Mg, Mn, Fe, Ni, Na, and Cl. However, no data are available for Cs-impurity measurements. A Diffusive Gradients in Thin films (DGT) device specific for cesium (Cs) is intended to be developed. Therefore, it is important to assess the impurity degree of agarose with Cs. Direct dissolution of agarose in 4 mol�L<sup>-1</sup> HNO<inf>3</inf> gives a concentration of 2.1?10<sup>-8</sup> mol�L<sup>-1</sup> of Cs, which is higher than that is found in natural environments (e.g. Cs<1?10<sup>-8</sup> mol�L<sup>-1</sup> in water). Two methods of Cs impurity removal have been tested, involving acidic cleaning with HCl and extraction by exchanger resin (KCuFC). Agarose powder was mixed with HCl in different concentrations, rinsed and dried. This method shows that the HCl-cleaning method is not quite efficient in removing the Cs impurity compared to untreated agarose gel. The second method, KCuFC resin was mixed with agarose powder in ultra-pure water, heated afterwards, and filtered. This method was able to reduce the amount of Cs by 99% compared to the untreated agarose gel. It appears that acceptable Cs levels (i.e. with respect to ambient Cs concentration in natural waters) are achievable by the removal of preexisting Cs in the agarose powder.

Item Type: Conference or Workshop Item (Paper)
Additional Information: Library Dosen
Uncontrolled Keywords: Cesium; Chlorine compounds; Cleaning; Copper compounds; Electrophoresis; Fluorine compounds; Powder metals; Removal; Resins; Sulfur compounds; Thin films; Trace elements; Agarose; Cleaning methods; Diffusion gradients; Diffusive gradients in thin films; Impurity removal; Natural environments; Potassium copper; Ultra pure water; Potassium compounds
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering > Nuclear engineering. Atomic power
Divisions: Faculty of Engineering > Nuclear and Physics Engineering Department
Depositing User: Sri JUNANDI
Date Deposited: 04 Mar 2026 04:27
Last Modified: 04 Mar 2026 04:27
URI: https://ir.lib.ugm.ac.id/id/eprint/25165

Actions (login required)

View Item
View Item