A flat-lying dimer as a key intermediate in NO reduction on Cu(100)

Kuroishi, Kenta and Al Fauzan, Muhammad Rifqi and Pham, Thanh Ngoc and Wang, Yuelin and Hamamoto, Yuji and Inagaki, Kouji and Shiotari, Akitoshi and Okuyama, Hiroshi and Hatta, Shinichiro and Aruga, Tetsuya and Hamada, Ikutaro and Morikawa, Yoshitada (2021) A flat-lying dimer as a key intermediate in NO reduction on Cu(100). Physical Chemistry Chemical Physics, 23 (31). 16880 – 16887. ISSN 14639076

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Abstract

The reaction of nitric oxide (NO) on Cu(100) is studied by scanning tunneling microscopy, electron energy loss spectroscopy and density functional theory calculations. The NO molecules adsorb mainly as monomers at 64 K, and react and dissociate to yield oxygen atoms on the surface at ∼70 K. The temperature required for the dissociation is significantly low for Cu(100), compared to those for Cu(111) and Cu(110). The minimum energy pathway of the reaction is via (NO)2 formation, which converts into a flat-lying ONNO and then dissociates into N2O and O with a considerably low activation energy. We propose that the formation of (NO)2 and flat-lying ONNO is the key to the exceptionally high reactivity of NO on Cu(100). This journal is © the Owner Societies.

Item Type: Article
Additional Information: Cited by: 9; All Open Access, Green Open Access
Uncontrolled Keywords: Activation energy; Copper metallography; Density functional theory; Dimers; Dissociation; Electron energy levels; Electron energy loss spectroscopy; Electron scattering; Energy dissipation; Nitric oxide; Scanning tunneling microscopy; Cu(1 1 0); Cu(1 1 1); High reactivity; Low-activation energy; Minimum energy pathways; NO molecule; NO reduction; Oxygen atom; Copper compounds
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions: Vocational School
Depositing User: Sri JUNANDI
Date Deposited: 05 Nov 2024 01:31
Last Modified: 05 Nov 2024 01:31
URI: https://ir.lib.ugm.ac.id/id/eprint/10479

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